Method of making fused silica
US5152819A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 26, 1991 |
| Grant date | Oct 6, 1992 |
| Priority date | — |
| Expiry date | Aug 26, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S65/901
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
This invention relates to the production of high purity fused silica glass through oxidation and/or flame hydrolysis of a halide-free, organosilicon-R compound in vapor form having the following properties: PA0 (a) producing a gas stream of a halide-free silicon-containing compound in vapor form capable of being converted through thermal decomposition with oxidation or flame hydrolysis to SiO.sub.2 ; PA0 (b) passing said gas stream into the flame of a combustion burner to form amorphous particles of fused SiO.sub.2 ; PA0 (c) depositing said amorphous particles onto a support; and PA0 (d) either essentially simultaneously with said deposition or subsequently thereto consolidating said deposit of amorphous particles into a virtually nonporous body; the improvement comprising utilizing a halide-free, organosilicon-R compound in vapor form having the following properties: PA1 (1) a Si--R bond dissociation energy that is no higher than the dissociation energy of the Si--O bond; PA1 (2) a boiling point no higher than 350.degree. C.; and PA1 (3) which, upon pyrolysis and/or hydrolysis, will produce decomposition products beside SiO.sub.2 which are deemed to be environmentally safe or the …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.