Photoresist
US5153101A · kind A · utility
17Cited by
2References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 13, 1990 |
| Grant date | Oct 6, 1992 |
| Priority date | — |
| Expiry date | Jun 13, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photocurable and solvent-developable compositions based on photopolymerizable (meth)acrylates, a photoinitiator for (meth)acrylates, an organic polymeric binder which comprises free carboxyl groups and has an acid number of at least 60, a blocked polyisocyanate crosslinking agent which has a cleavage temperature of at least 100.degree. C., and an inert solvent in an amount such that the photocurable composition is pourable, are described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.