High-pressure gas laser apparatus and method of laser processing
US5153892A · kind A · utility
12Cited by
6References
50Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 11, 1991 |
| Grant date | Oct 6, 1992 |
| Priority date | — |
| Expiry date | Jan 11, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/09713
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A novel gas laser apparatus is disclosed, which comprises a hermetic container with a gas laser medium sealed therein, a plurality of main discharge electrodes arranged in the hermetic container for causing the main discharge in the gas laser medium thereby to generate a laser beam, and a device for subjecting the discharge space between the main discharge electrodes to preionization over a wide range thereof before the main discharge by use of a reflected laser beam or an ultraviolet ray lamp.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.