Polishing process for refractory materials
US5154023A · kind A · utility
60Cited by
9References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 11, 1991 |
| Grant date | Oct 13, 1992 |
| Priority date | — |
| Expiry date | Jun 11, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/89
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A cost-effective process for polishing refractory materials, including natural and synthetic diamond, sapphire, ruby and Si.sub.3 N.sub.4 balls, is disclosed, wherein the surfaces thereof are successively softened to a predetermined depth by ion implantation, followed by mechanical polishing. This cycle of ion-implantation softening, followed by mechanical polishing, is repeated until such time that surface profilometry indicates that a desired surface smoothness has been achieved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.