Wave front aberration measuring apparatus
US5157459A · kind A · utility
17Cited by
4References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 29, 1990 |
| Grant date | Oct 20, 1992 |
| Priority date | — |
| Expiry date | Aug 29, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B11/10576
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An apparatus for measuring a wave front aberration including a light beam splitter for dividing a parallel laser light beam incident from a measuring object into two beam fluxes, an image rotator disposed in at least one optical path of the divided beam fluxes for rotating the wave from on the optical axis, an interference device for interfering, after superposing the beam fluxes, whose wave fronts are rotated relatively, an imaging lens for forming the interfered beam into an image, and an observation device for observing the imaged interference fringes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.