Method for production of predetermined concentration graded alloys
US5158653A · kind A · utility
Inventors
Key dates
| Filing date | Sep 26, 1988 |
| Grant date | Oct 27, 1992 |
| Priority date | — |
| Expiry date | Sep 26, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S204/09
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for the production of a composition modulated alloy having a predetermined concentration is disclosed, in which alternating layers of at least two metals are successively deposited upon a substrate by electrodeposition, vacuum deposition, vapor deposition, or sputtering. The individual thicknesses of at least one metal's layers are varied in a predetermined manner. Pulsed galvanostatic electrodeposition using a tailored waveform is preferred. A copper-nickel concentration graded alloy is disclosed. Concentration graded alloys of predetermined concentration having at least one region of local homogeneity are also disclosed. The region of local homogeneity has a thickness corresponding to the thickness of two adjacent layers of different metals which have been diffusion annealed together. A pulsed electrodeposition/diffusion anneal process for production of such alloys is also disclosed. An electrochemical deposition method is also disclosed for the production of a non-layered, continuous concentration graded alloy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.