Method for manufacturing an oxide superconductor thin film
US5158931A · kind A · utility
10Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 16, 1989 |
| Grant date | Oct 27, 1992 |
| Priority date | — |
| Expiry date | Nov 16, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/734
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A laser beam 5 is directed to a target made of an oxide superconductor to allow a target spot which is irradiated with the beam to be evaporated and a matter which is evaporated to be deposited as a thin film on the surface of a substrate 3 at which time excited oxygen is supplied to or near a thin film deposition site on the substrate 3. In this way, an oxide superconductor thin film is formed on the substrate with oxygen atoms incorporated in the crystal structure of the thin film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.