Apparatus for vaporizing and supplying organometal compounds
US5160542A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Sep 11, 1990 |
| Grant date | Nov 3, 1992 |
| Priority date | — |
| Expiry date | Sep 11, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B25/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for vaporizing and supplying an organometal compound comprising a gas flow path for starting gas which connects a container filled with the organometal compound to a crystal growth chamber heated under reduced pressure through a main valve, a massflow controller for the starting gas and a valve for supplying the starting gas; and a flow path for a carrier gas which connects a carrier gas source to the discharge outlet of the valve for supplying the starting gas through a massflow controller for carrier gas and a heat exchanger. The container, the flow path for the starting gas and the flow path for the carrier gas are arranged in a constant temperature oven.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.