Sputtering target for producing electroconductive transparent films and process for manufacture thereof
US5160675A · kind A · utility
17Cited by
3References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 16, 1989 |
| Grant date | Nov 3, 1992 |
| Priority date | — |
| Expiry date | May 16, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/3407
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A sputter target for producing electroconductive transparent films, which comprises indium oxide and tin oxide and having a shape such that not less than 80% by weight of the target is present in an erosion area on sputtering, and a process for manufacturing the sputtering target which comprises molding a slurry or a powder mixture containing indium oxide and tin oxide into a molded shape and sintering the molded shape are disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.