Patent · US Expired

Polyamide and film made from at least one monomolecular layer of a polyamide

US5166307A · kind A · utility

2Cited by
5References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 5, 1989
Grant dateNov 24, 1992
Priority date
Expiry dateSep 5, 2009

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31728
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Polyamides of the general formula [N(A)-X-N(B)-CO-Y-CO-].sub.n are described, in which Y denotes a divalent group, X a divalent radical whose chain contains at least two carbon atoms, A and B independently of one another denote H or a C.sub.1 to C.sub.26 alkyl group and n denotes an integer greater than 4. The said polyamides contain at least one alkyl group of C.sub.6 to C.sub.26 per repeating unit. The groups X and/or Y contain at leat one CH.sub.2 group in the chain. The polyamides are prepared by reaction of a diamine of the formula NHA-X-NHB with an about equimolar amount of a reactive derivative of a dicarboxylic acid of the formula COOH-Y-COOH. The polyamides obtained can be used in order to prepare highly ordered monomolecular LB films on a support. For this purpose, the polyamide is dissolved in a volatile organic solvent which is immiscible with water and the solution is spread on the water/air interface. After evaporation of the solvent the layer is compressed and transferred to a solid support by the LB technique. The film is very stable and can be used to prepare optical waveguide systems, filters for optical purposes or protective layers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.