Through the wafer optical transmission sensor
US5166525A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 11, 1991 |
| Grant date | Nov 24, 1992 |
| Priority date | — |
| Expiry date | Feb 11, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/3563
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A device for the optical measurement of light transmitted through silicon wafers and other media during the manufacture of electronic components and particularly during processing within a spray environment. The device is characterized by being a stationary assembly designed to provide structurally inherent optical alignment and focus. In addition the device is provided with a geometry specifically designed to direct any condensate flow away from the surface of the wafer, and with surface characteristics which minimize droplet separation from the surface of the device within a spray environment. The device is designed to permit its location out of the main spray pattern. The light source of the device is made as small as possible to minimize intrusion into the process environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.