Exposure apparatus
US5168306A · kind A · utility
17Cited by
12References
37Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 6, 1992 |
| Grant date | Dec 1, 1992 |
| Priority date | — |
| Expiry date | Apr 6, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70358
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus where a mask table having an exposing pattern and a work to be exposed are relative to each other movable, wherein the moving amount of the mask table is detected by a scale image formed through a projection lens system, so that even if the projection lens system has a magnification error, by optically offsetting it, the moving amount of the mask table can be detected. Thus, a more accurate control can be obtained so that a mask image can be more precisely reproduced on a work.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.