Patent · US Expired

Formation of high quality patterns for substrates and apparatus therefor

US5168454A · kind A · utility

51Cited by
18References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 30, 1989
Grant dateDec 1, 1992
Priority date
Expiry dateOct 30, 2009

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K3/0017
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

An apparatus and method for accurately and rapidly machining a workpiece, particularly for drilling holes smaller than can be formed by other methods, by using a high power pulsed Nd:YAG laser. A low power HeNe laser is joined to the optical path of the high power laser. The colinear beams then scan along one axis of the workpiece. The low power beam is partially split off to a location determining device before final deflection to the workpiece. Deflection in a second axis is achieved by linearly moving the workpiece so that the beam will impinge upon the desired location of the workpiece.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.