Binary acetal polymers useful in photosensitive compositions and lithographic printing plates
US5169897A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 30, 1991 |
| Grant date | Dec 8, 1992 |
| Priority date | — |
| Expiry date | Jul 30, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F2810/30
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Novel binary acetal polymers are comprised of recurring units which include two six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group and the other of which is substituted with an aromatic or heterocyclic moiety. The binary acetal polymers are advantageously employed in photosensitive compositions in which they are utilized in combination with diazo resins. Such photosensitive compositions are especially well adapted for use in lithographic printing plates which can be developed with aqueous developing solutions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.