Patent · US Expired

Apparatus and a method for alignment verification having an opaque work piece between two artwork masters

US5170058A · kind A · utility

13Cited by
9References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 30, 1991
Grant dateDec 8, 1992
Priority date
Expiry dateOct 30, 2011

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F9/70
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The present invention relates generally to a new apparatus and a method for alignment verification. More particularly, the invention encompasses an apparatus that allows the imaging on a structure from opposite sides while the imaging masks are on the opposite sides of the structure, and the masks and the structure are all aligned with each other. This apparatus also discloses means that can verify that the two imaging masks that are on the opposite sides of each other are aligned with each other during imaging processing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.