Exposure mechanism
US5170293A · kind A · utility
5Cited by
7References
4Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 13, 1992 |
| Grant date | Dec 8, 1992 |
| Priority date | — |
| Expiry date | Feb 13, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure mechanism having a hole pattern for forming a resist pattern to be used in a photolithography process when a semiconductor device is fabricated, the hole pattern including a central light transmitting portion provided on a transparent substrate, through which exposed light can pass, a plurality of slit-shaped light transmitting portions provided around the central light transmitting portion, and a light intercepting portion provided on the transparent substrate for forming the central light transmitting portion and the slit-shaped light transmitting portions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.