Thick film mask separation detection system
US5174201A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 7, 1991 |
| Grant date | Dec 29, 1992 |
| Priority date | — |
| Expiry date | Jun 7, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/11
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
An apparatus and method for screening a pattern of material onto a surface including detection of the instant of separation of the mask from the surface after screening. Particularly as applied to a process for making a multi-layer ceramic device with an automated apparatus, the screening process is speeded by initiating high speed movement immediately when the separation of the mask from the surface is complete. In a preferred embodiment, a shock absorber is used to limit the rate of change of motion of the mask and a sensor is placed directly on a portion of the shock absorber structure. Noise reduction is accomplished through differential sensing and thresholding to improve detection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.