Uniform gas distributor to a wafer
US5174825A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 1990 |
| Grant date | Dec 29, 1992 |
| Priority date | — |
| Expiry date | Aug 23, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B31/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas distribution system 140 includes a gas distribution chamber 142 and a gas distributor 154. Gas distribution chamber 142 includes an open end 144 and a closed end 146. A workpiece 148 is disposed adjacent closed end 146. Gas distributor 154 includes an outer collar 156 and an inner collar 158. Inner collar 158 has a continuously increasing cross-sectional diameter from a first predetermined point 160 to a second predetermined point 162. Gases are introduced through an inlet tube 150 disposed through an aperture in a platform 152 into the interior of inner collar 158 and toward workpiece 148. A diverter 164 diverts incoming gases from inlet tube 150.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.