Patent · US Expired

Uniform gas distributor to a wafer

US5174825A · kind A · utility

12Cited by
2References
35Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 23, 1990
Grant dateDec 29, 1992
Priority date
Expiry dateAug 23, 2010

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B31/16
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A gas distribution system 140 includes a gas distribution chamber 142 and a gas distributor 154. Gas distribution chamber 142 includes an open end 144 and a closed end 146. A workpiece 148 is disposed adjacent closed end 146. Gas distributor 154 includes an outer collar 156 and an inner collar 158. Inner collar 158 has a continuously increasing cross-sectional diameter from a first predetermined point 160 to a second predetermined point 162. Gases are introduced through an inlet tube 150 disposed through an aperture in a platform 152 into the interior of inner collar 158 and toward workpiece 148. A diverter 164 diverts incoming gases from inlet tube 150.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.