Process for depositing a layer containing boron and nitrogen

US5175020A · kind A · utility

Assignee

• Solvay Deutschland GmbH · DE

Inventors

• Guenther Doellein · Hannover, DE
• Guenter Weidenbach · Hannover, DE
• Hans-Robert Meyer · Hamburg, DE
• Udo Bringmann · Halstenbek, DE
• Andreas Weber · Rabenau, DE
• Claus-Peter Klages · Braunschweig, DE

Key dates

• Filing date: Apr 24, 1992
• Grant date: Dec 29, 1992
• Expiry date: Apr 24, 2012

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/342
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A process for depositing a layer containing boron and nitrogen on a substrate by decomposing one or more N-substituted borazoles in the presence of the substrate, in particular by a plasma CVD process.