Water-developable photosensitive composition for producing relief plates
US5175076A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 17, 1991 |
| Grant date | Dec 29, 1992 |
| Priority date | — |
| Expiry date | Dec 17, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/121
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A water-developable photosensitive resin plate suitable for the manufacture of a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which comprises: PA0 (A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer (ii) and .alpha., .beta.-ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the .alpha., .beta.-ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being respectively from about 5 to 95 mol %, from about 1 to 30 mol %, from about 0.1 to 10 mol % and 0 to 70 mol % based on the combination of those monomeric components; PA0 (B) a basic nitrogen atom-containing compound; PA0 (C) an ethylenically unsaturated monomer; and PA0 (D) a photopolymerization initiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.