Polydiorganosiloxane/thiuram disulfide block copolymers and radical polymerization of vinyl monomers therewith
US5175226A · kind A · utility
1Cited by
8References
4Claims
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Key dates
| Filing date | Apr 13, 1990 |
| Grant date | Dec 29, 1992 |
| Priority date | — |
| Expiry date | Apr 13, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G77/54
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Polydiorganosiloxane/thiuram disulfide block copolymers having the formula: ##STR1## well adapted as "polyiniferters" in the radical polymerization of vinyl monomers, e.g., the (meth)acrylates or styrene, are prepared by reacting a corresponding .alpha.,.omega.-(amino)diorganopolysiloxane with CS.sub.2 in the presence of a tertiary amine and an oxidizing agent, e.g., iodine.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.