Power monitor of RF plasma
US5175472A · kind A · utility
112Cited by
6References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 30, 1991 |
| Grant date | Dec 29, 1992 |
| Priority date | — |
| Expiry date | Dec 30, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H7/02
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An RF plasma power monitor that monitor voltage, current and DC bias adjacent the plasma load and processes the sensed data in a digital data processor to provide true power at the load. Provision is also made for the control of an RF power source to maintain power at the load at a preset level irrespective on impedance fluctuations and reflections.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.