X-ray mask and method for producing same
US5177773A · kind A · utility
2Cited by
1References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 1991 |
| Grant date | Jan 5, 1993 |
| Priority date | — |
| Expiry date | Mar 25, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An X-ray mask comprises an absorber pattern composed of a material capable of absorbing X-ray, a mask substrate for supporting the absorber pattern, composed of a material capable of transmitting X-ray, and a support frame for supporting the mask substrate, wherein the mask substrate is composed of a mask substrate material whose impurity content is suppressed to reduce positional distortions generated by X-ray radiation. Generation of positional distortions by X-ray exposure is inhibited and an arrangement of mask pattern can be ensured with a high precision.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.