Method for forming an optical waveguide by selective volatization
US5178658A · kind A · utility
8Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 17, 1991 |
| Grant date | Jan 12, 1993 |
| Priority date | — |
| Expiry date | Sep 17, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12171
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of forming an optical waveguide which includes the steps of forming on a substrate a waveguide layer including at least one host medium and one dopant medium, one of which is more volatile than the other; and heating the waveguide layer to selectively volatize the more volatile medium along a path, raising the index of refraction and creating a waveguide along the path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.