Filtration system to remove photoresist film particles
US5178759A · kind A · utility
2Cited by
9References
2Claims
0Family size
Inventors
Key dates
| Filing date | Oct 23, 1990 |
| Grant date | Jan 12, 1993 |
| Priority date | — |
| Expiry date | Oct 23, 2010 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D33/72
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method for removing a liquid stripper composition from a slurry comprised of the liquid stripper composition and of photoresist film particles which were removed from a circuit board substrate by using the liquid stripper composition. The slurry flows over the inner surface of the porous wall of a drum under gravity to form a generally uniform layer on the inner surface of the drum. Liquid escapes from the slurry through the porous wall of the drum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.