Stationary magnetron sputtering cathode for a vacuum coating apparatus

US5182003A · kind A · utility

Assignee

• Leybold GmBH · DE

Inventors

• Wolfram Maass · Gelnhausen, DE
• Ulrich Patz · Gelnhausen, DE

Key dates

• Filing date: Feb 28, 1991
• Grant date: Jan 26, 1993
• Expiry date: Feb 28, 2011

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/35
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

A stationary magnetron sputtering cathode for vacuum coating systems for substrates 17 passing in front of the cathode 10 on a circular path K and disposed on a substrate holder 4 has a circular disk-like yoke plate 15, and a first group or row of magnets 14b, 14b'. . . , essentially forming a closed circular ring, is provided in the marginal zone of the yoke plate 15 and a second group or row of magnets 14a, 14a'. . . , forming a random but essentially symmetric configuration, is provided in the center of the yoke plate 15. The segment of the magnetic tunnel located in the half (III+IV) of the yoke plate 15 which faces away from the rotating shaft 5 of the substrate holder 4 has a greater total length than the tunnel segment provided on the half (I+II) of yoke plate 15 facing toward the rotating shaft 5.