Method for processing residues from the distillation of chlorosilanes
US5182095A · kind A · utility
8Cited by
7References
5Claims
0Family size
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Key dates
| Filing date | Jul 12, 1991 |
| Grant date | Jan 26, 1993 |
| Priority date | — |
| Expiry date | Jul 12, 2011 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA62D2101/22
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A residue from the production of chlorosilanes from raw silicon is treated with steam and aditionally with nitrogen-oxygen mixtures. The resulting residue has a lower chloride content.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.