Patent · US Expired

Method for processing residues from the distillation of chlorosilanes

US5182095A · kind A · utility

8Cited by
7References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 12, 1991
Grant dateJan 26, 1993
Priority date
Expiry dateJul 12, 2011

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA62D2101/22
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A residue from the production of chlorosilanes from raw silicon is treated with steam and aditionally with nitrogen-oxygen mixtures. The resulting residue has a lower chloride content.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.