Patent · US Expired

Ethylene copolymer and method of producing same

US5182349A · kind A · utility

3Cited by
2References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 15, 1991
Grant dateJan 26, 1993
Priority date
Expiry dateJul 15, 2011

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08F210/02
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A copolymer is manufactured by allowing ethylene (A) and vinyl compounds (B) represented by the following general formula to undergo radical polymerization at a pressure of 1000-5000 kg/cm.sup.2 and a temperature of 100.degree.-400.degree. C., ##STR1## wherein R.sub.1 and R.sub.2 are each an independent hydrogen atom or a methyl group, R.sub.3 is a hydrogen atom or an alkyl group of 1-4 carbon atoms; a ratio of (B) to the sum of (A) and (B) is less than 1 mol %; a proportion of the amount of vinyl compounds (B), which are not successively bonded at all to the units (B) in the chain, but bonded to unlike units (A) on both sides thereof, to the total amount of (B) units in the copolymer is at least a 83%; and an MFR of the copolymer ranges from 0.1 to 200 g/10 min. Although the copolymer contains only a small amount of the vinyl compound (B) it nevertheless has excellent photo stabilizing effects.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.