Photo CVD apparatus with a glow discharge system
US5183511A · kind A · utility
510Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 12, 1989 |
| Grant date | Feb 2, 1993 |
| Priority date | — |
| Expiry date | May 12, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32862
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A photo CVD apparatus includes a reaction chamber, a light source for radiating light to the inside of the chamber through a light window, and a pair of electrodes disposed in the chamber for glow discharge, one of the electrodes being located on the light window. After deposition by photo CVD, a light window for transmission of UV light is cleaned by plasma etching by virtue of glow discharge taking place between the electrodes. The light source and the electrodes for plasma etching share one power supply for supplying high frequency electric power.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.