Plasma processing method and products thereof
US5185179A · kind A · utility
22Cited by
5References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 5, 1989 |
| Grant date | Feb 9, 1993 |
| Priority date | — |
| Expiry date | Oct 5, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/26
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Carbonaceous films are coated on a surface by chemical vapor reation. In advance of the deposition of carbonaceous film, a silicon nitride film as coated on the surface to prevent interdiffusion between the carbonaceous film and the underlying surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.