Gas monitor
US5187972A · kind A · utility
35Cited by
7References
41Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 17, 1992 |
| Grant date | Feb 23, 1993 |
| Priority date | — |
| Expiry date | Jan 17, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N30/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A gas (including water vapor) monitor is provided which incorporates a dual chambered, constant volume peristaltic pump and flow meters. A sample gas is pumped at a constant volumetric flow rate into a processing zone where a predetermined component of the sample gas is separated. A make-up gas is then allowed to admix with the resulting gas and the mixture is then pumped at the same constant rate. The measured volume of the make-up gas thus required is equal to the actual volume of the separated component.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.