Microwave plasma generating apparatus and process for the preparation of diamond thin film utilizing same
US5188862A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 24, 1990 |
| Grant date | Feb 23, 1993 |
| Priority date | — |
| Expiry date | Sep 24, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1004
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A microwave plasma generating apparatus for generating plasma by radiating microwave into a space in which electric discharge takes place contains a plurality of microwave radiating means for radiating a plurality of microwaves having different directions of electric fields from each other. This microwave plasma generating apparatus can produce a diamond thin film by exciting a carbon source gas supplied into the space and bringing the excited gas into contact with a substrate to be formed thereon with the diamond thin film, the substrate being disposed in the space in which the electric discharge is performed. This apparatus can produce a large volume of plasma in a stable fashion and, as a result, provide a diamond thin film in a large area as a whole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.