Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers
US5190637A · kind A · utility
224Cited by
24References
21Claims
0Family size
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Key dates
| Filing date | Apr 24, 1992 |
| Grant date | Mar 2, 1993 |
| Priority date | — |
| Expiry date | Apr 24, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/094
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.