Plasma reactor chamber
US5190703A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 24, 1990 |
| Grant date | Mar 2, 1993 |
| Priority date | — |
| Expiry date | Dec 24, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/162
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention includes a plasma reactor chamber, which is generally constructed such that a large opening exists in a wall of the chamber. The reactor chamber is deployed remotely from a control console, such as on a robotic arm. A plasma generating means, such as RF electrodes is disposed within the chamber and a flexible vacuum seal is engaged to the outer edge of the chamber wall, surrounding the opening. Operating components, such as a vacuum pump, plasma gas supply and RF generator are disposed within the control console, and various supply lines join the operating components to the reactor chamber. In operation, the reactor chambler is placed against a portion of a surface that is to be treated, and a low pressure plasma is created within the chamber to treat the zone of the surface enclosed within the seal of the chamber. Particularly shaped seals for irregularly shaped surfaces and a rolling seal for movement of the reactor chamber relative to a surface are within the contemplation of the invention.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.