Patent · US Expired

High yield manufacturing process for silicon carbide

US5190737A · kind A · utility

32Cited by
19References
26Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 30, 1991
Grant dateMar 2, 1993
Priority date
Expiry dateApr 30, 2011

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2006/80
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A process for preparing silicon carbide by carbothermal reduction which includes transporting, in a gaseous medium, a particulate reactive mixture of a silica source and a carbon source through a reaction zone. The heating rate of the atmosphere within the reaction zone is such that substantially all of the reactive mixture is heated at a heating rate of at least about 100.degree. C./second until an elevated temperature of at least 1800.degree. C. is reached. Either (1) carbon monoxide is added to the reaction zone or (2) a carbon monoxide level in the reaction is achieved in order to provide at least about 30 mole percent of the gases exiting the reaction zone to achieve a higher yield of silicon carbide.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.