High yield manufacturing process for silicon carbide
US5190737A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 30, 1991 |
| Grant date | Mar 2, 1993 |
| Priority date | — |
| Expiry date | Apr 30, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/80
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A process for preparing silicon carbide by carbothermal reduction which includes transporting, in a gaseous medium, a particulate reactive mixture of a silica source and a carbon source through a reaction zone. The heating rate of the atmosphere within the reaction zone is such that substantially all of the reactive mixture is heated at a heating rate of at least about 100.degree. C./second until an elevated temperature of at least 1800.degree. C. is reached. Either (1) carbon monoxide is added to the reaction zone or (2) a carbon monoxide level in the reaction is achieved in order to provide at least about 30 mole percent of the gases exiting the reaction zone to achieve a higher yield of silicon carbide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.