Sulfonium salts having acid-labile groups
US5191124A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 30, 1988 |
| Grant date | Mar 2, 1993 |
| Priority date | — |
| Expiry date | Jun 30, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/029
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Sulfonium salts of the general formula ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are identical or different and are aliphatic and/or aromatic radicals which may contain heteroatoms, or two of the radicals R.sup.1 and R.sup.3 are bonded to one another to form a ring, with the proviso that one or more of the radicals R.sup.1 to R.sup.3 contain one or more acid-cleavable groups, or one of the radicals R.sup.1 to R.sup.3 is bonded to one or more further sulfonium salt radicals, if desired via acid-cleavable groups, and X.sup..crclbar. is a non-nucleophilic counter-ion, are suitable as photoinitiators for cationic polymerization.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.