Gas discharge tube providing improved flow line of electrons
US5191260A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 1991 |
| Grant date | Mar 2, 1993 |
| Priority date | — |
| Expiry date | Aug 23, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J61/103
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas discharge tube having an outer envelope in which deuterium gas is filled. In the envelope, an anode, a cathode and a first shield cover for surrounding these electrodes are disposed. A second shield cover is disposed within the first shield cover and at a position adjacent the anode to divide an internal space defined by the first shield cover into a first chamber in which the anode is positioned and a second chamber in which a cathode is positioned. A plasma arc generating portion is positioned at the second shield cover. A plasma arc generated on the plasma arc generating portion provides an optical axis extending linearly toward the outer envelope through an opening of the first shield cover. The cathode is disposed at a position offset from the optical axis for providing a flow line of electrons from the cathode to the anode in a direction obliquely with respect to the optical axis. A shield member is further provided at a position immediately adjacent the plasma arc generating portion for largely bending the flow line of the electrons at a tip end portion of the shield member and for directing the flow line substantially coincident with the optical axis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.