Method of forming an optical channel waveguide by thermal diffusion
US5194079A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 4, 1992 |
| Grant date | Mar 16, 1993 |
| Priority date | — |
| Expiry date | Feb 4, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12171
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of forming an optical channel waveguide includes forming on a substrate a waveguide layer of silica doped with an index of refraction raising dopant whose concentration profile in a first dimension includes a higher concentration region and an adjacent lower concentration region; and heating the waveguide layer along two spaced areas defined in the second and third dimension which define a path between them for diffusing the dopant along the first dimension from the higher concentration region to the lower concentration region to reduce the index of refraction of the higher concentration region in portions of the higher concentration region proximate the spaced areas and create a waveguide along the path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.