Method and apparatus relating to ion implantation
US5194748A · kind A · utility
7Cited by
5References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 21, 1991 |
| Grant date | Mar 16, 1993 |
| Priority date | — |
| Expiry date | Jun 21, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/20228
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In ion implantation apparatus, a plurality of targets on supports are presented to an ion beam. The targets are moved back and forth in reciprocatory motion through the ion beam. Each target is reversed while outside the ion beam, and the reversals of the targets are effected while another target or targets is or are moving through the beam. Where two targets are presented, the sequence is that the two target supports follow each other through the ion beam in one direction, and then follow each other through the beam in the opposite direction, each target being reversed in direction while the other is passing through the beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.