Electron beam deflector with magnetic correction field and incorporated auxiliary magnetic shielding
US5194776A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Nov 7, 1991 |
| Grant date | Mar 16, 1993 |
| Priority date | — |
| Expiry date | Nov 7, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J29/701
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An improved electron beam deflector with incorporated permanent magnets for picture correction, where the magnets and the magnetic field generated by these magnets are surrounded by an auxiliary magnetic shielding that forms one piece with the deflector and is positioned with high geometrical precision with respect to the magnets. This auxiliary shielding causes the picture correction efficiency to be unaffected by the shape and geometry of positioning of the metal elements in the vicinity of the deflector when it is being assembled and during its operation. The deflector can be used with picture tube devices, particularly of the cathode-ray type.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.