Apparatus and process for electrophoretic deposition
US5196098A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 4, 1988 |
| Grant date | Mar 23, 1993 |
| Priority date | — |
| Expiry date | Jan 4, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/1572
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for electrodeposition of insulating coatings such as photoresists having uniform thickness throughout the coating. The apparatus comprises one or more cathodes disposed in a bath containing an electrophoretic depositing composition, one or more anodes disposed in said bath in face to face relationship with the cathode, and means for applying a voltage between the anode and the cathode to produce a current whereby a current density gradient is formed on the cathode, the gradient comprising high and low current density areas. The anode of the present invention is configured so that the anode is concentrated opposite the high current density areas of the cathode, thereby controlling the thickness of deposition by controlling the amount of current flowing to the cathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.