Method for control of photoresist develop processes
US5196285A · kind A · utility
43Cited by
13References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 18, 1990 |
| Grant date | Mar 23, 1993 |
| Priority date | — |
| Expiry date | May 18, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for the control of photoresist develop processes employing multiple spray-puddle steps in which process changes other than time, such as endpoint are used to determine the length of the spray and puddle steps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.