Pin chuck for lithography system
US5197089A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 21, 1990 |
| Grant date | Mar 23, 1993 |
| Priority date | — |
| Expiry date | May 21, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/682
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pin chuck holds a wafer during translation by an X-ray lithography machine. The chuck is designed to be the same size as the wafer and includes a plurality of extensions having tops along a common plane. The space between the extensions is evacuated to hold and level the wafer. In order to load or remove a wafer from the pin chuck, three extendable posts are provided which can be extended to permit a robot arm to position a wafer thereon for lowering to the pin chuck or remove a wafer therefrom lifted from the pin chuck. The three posts are triangularly positioned within a space sufficient to hold the wafer which at the same time close enough together to permit the fingers of the robot arm to fit therearound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.