Method and apparatus for high resolution inspection of electronic items
US5199054A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 30, 1990 |
| Grant date | Mar 30, 1993 |
| Priority date | — |
| Expiry date | Aug 30, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/302
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A high resolution laminography system for the inspection of integrated circuits wherein a beam of highly focused electrons is traced in a circular pattern on a flat target within a vacuum chamber. The target converts the electron beam into X-rays, so that a source of X-rays is produced which rotates in synchronization with a rotating detector assembly. An object is placed within the vacuum chamber, between the X-ray source and the detector so that an X-ray cross sectional image of a cutting plane of the object is produced. A computer and feedback system controls image acquisition and an automated positioning system. The computer system can also operate under program control to automatically analyze data, measure characteristics of the object under inspection, and make decisions regarding the acceptability of the object's quality. The invention also employs a channeltron imager to directly image the target so that the condition of the target may be monitored, and electron drift within the system can be compensated for.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.