Patent · US Expired

Source distance adjustment arrangement for uniform illumination of projection surface

US5200603A · kind A · utility

4Cited by

2References

10Claims

0Family size

Assignee

Agfa-Gevaert NV · BE

Inventors

Hubert Hackenberg · Munich, DE
Traugott Liermann · Unterhaching, DE
Hans-Joachim Schrecke · Grasbrunn, DE

Key dates

Filing date	Apr 22, 1992
Grant date	Apr 6, 1993
Priority date	—
Expiry date	Apr 22, 2012

Classification

Technology area (CPC G)Physics
CPC primaryG03B27/74
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A uniform illumination of the projection surface is obtained by measuring light intensity of a projection surface and adjusting a distance between a light source and an optical element in response to the measured light intensity to optimize brightness and/or distribution.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.