Sensor for controlling water quality of reactor and method of controlling said water chemistry
US5201229A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 25, 1990 |
| Grant date | Apr 13, 1993 |
| Priority date | — |
| Expiry date | Oct 25, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N27/205
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An element (e.g., a sensor) has a fine-line thin film of a conductor formed on a non-conductive substrate, and a change of physical properties (e.g., deformation) of the substrate or the ambient environment is detected through a change in physical properties of the conductor. The element is manufactured by forming a layered film, composed of a semiconductor and a conductor, on the substrate, and forcibly diffusing part of this film, e.g., by selective irradiation with high-energy ions, to form this part into an alloy semi-conductor, thereby providing a two-dimensional pattern of the fine lines of the conductor and the semiconductor. By arranging a plurality of fine lines of a conductor transversely to a direction of growth of a crack in the substrate, crack in the substrate is detected through a change in electrical resistance of the fine lines. A dissolved oxygen sensor, a hydrogen sensor, and an electrical conductivity sensor (of an ambient medium) can also be provided. To control water chemistry of a reactor, an amount of a water chemistry improving agent injected is controlled in accordance with an output of a water chemistry measurement sensor provided in water in a pressure v…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.