Method for making tapered microminiature silicon structures
US5201992A · kind A · utility
103Cited by
12References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 8, 1991 |
| Grant date | Apr 13, 1993 |
| Priority date | — |
| Expiry date | Oct 8, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2209/0226
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Tapered silicon structures, of interest for use, e.g., in atomic force microscopes, in field-emission devices, and in solid state devices are made using silicon processing technology. Resulting tapered structures have, at their tip, a radius of curvature of 10 nanometers or less. Such preferred silicon structures are particularly suited as electron emitters in display devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.