Patent · US Expired

Photoconductive recording material with special outermost layer

US5208128A · kind A · utility

6Cited by

3References

13Claims

0Family size

Assignee

Agfa-Gevaert NV · BE

Inventors

David R. Terrell · Lint, BE
Stefaan De Meutter · Ekeren, BE
Peter Horlacher · Senden, DE
Volker Serini · Krefeld, DE
Ulrich Grigo · New Martinsville, US

Key dates

Filing date	Nov 9, 1990
Grant date	May 4, 1993
Priority date	—
Expiry date	Nov 9, 2010

Classification

Technology area (CPC G)Physics
CPC primaryG03G5/14791
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Photoconductive recording material which incorporates in an outermost layer a siloxane-copolymer including at least one polysiloxane block that is copolymerized with aromatic carbonate units, wherein the polysiloxane block(s) consist(s) of 5 to 200 chemically bonded diorgano siloxy units in which the organic substituents are selected from the group consisting of an alkyl, an aralkyl, an alkaryl and an aryl group, and said block(s) is (are) present in an amount by weight in the range of 0.3% to 6% with respect to the total weight of said copolymer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.