Patent · US Expired

Metal film forming method

US5208187A · kind A · utility

25Cited by
3References
14Claims
0Family size

Inventors

Key dates

Filing dateJul 8, 1991
Grant dateMay 4, 1993
Priority date
Expiry dateJul 8, 2011

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A metal film forming method comprises steps of: PA0 forming a non-monocrystalline metal film principally composed of aluminum, in contact, at least in a part thereof, with a monocrystalline metal principally composed of aluminum; and PA0 heating the non-monocrystalline metal film to convert at least a part thereof into monocrystalline state.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.