Optical projection exposure method and system using the same
US5208629A · kind A · utility
40Cited by
4References
91Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 3, 1992 |
| Grant date | May 4, 1993 |
| Priority date | — |
| Expiry date | Apr 3, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to this invention, illumination light for illuminating a mask on which a micropattern is drawn is inclined at an angle corresponding to a numerical aperture of an optical projection lens located below the mask with respect to an optical axis. The illumination light is obliquely incident on the mask to expose the micropattern on an object located below the optical projection lens.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.